Expertise and services: analysis of the chemical composition of materials using LIBS in the 175-1300 nm range; 2D mapping of the chemical composition of the surface; in-depth chemical analysis; on-line monitoring of laser micromachining processes via LIBS.
Laser sources
Amplified Yb:KGW laser (Pharos, Light Conversion Ltd.): adjustable pulse duration in the range of 190 fs – 10 ps, wavelength 1030 nm, energy up to 1 mJ, average power 6 W, pulse repetition rate up to 200 kHz, integrated second harmonic generation module, home-built module for third harmonic generation.
Q-switched nanosecond Nd:YAG laser: wavelength 1064 nm; pulse repetition rate 1-20 Hz; pulse duration 3-5 ns; pulse energy up to 1.2 J, integrated second and third harmonics modules.
Instruments and accessories
LIBS interaction chamber (AtomTrace) with motorized 3-axis sample manipulation, integrated autofocus system of laser beam and interactive online sample view, pressure range 1-1300 mbar, different atmospheres e.g. He, Xe, Ar, etc.; apochromatic optical system for the collection of plasma emission in the 175-1300 nm spectral range; LIBS Software AtomAnalyzer (AtomTrace) for spectra processing.
Four-channel Digital Delay Generator (AC-DDG-4, AtomTrace) for time-gated LIBS measurements
High bandpass and high resolution Echelle spectrograph (Mechelle ME5000, Andor Technology) with integrated intensified CCD camera (iStar DH334T, Andor Technology/Oxford Instruments), detection range 380 - 1090 nm; Andor Solis (Andor Technology/Oxford Instruments) software for automatic extraction of full-range calibrated spectra from a complex echelle image; peak labeling with NIST table.
Home-built single/multiple-pulse LIBS setup with motorized and programmable XY-axis translation stages, beam focusing and plasma emission collection optical systems for measurements of custom-size samples, high temperature regimes and very tight beam focusing geometry.
Compact deep UV OEM spectrometer (FREEDOM HR-DUV, Ibsen Photonics) with integrated detector Hamamatsu S11156-2048-02, detection range 178-409 nm, resolution 0.3 nm; optomechanical system for integration into LIBS interaction chamber.
On request, supplementary instruments, e.g. SEM EDX, optical microscope, profilometer, etc., are available from the General Equipment list.